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GA113 - Residual solvents in pharmaceuticals

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Compounds

1-Butanol
1-Propanol
2-Butanone(MEK)
2-Propanol(Isopropyl alcohol)
Acetic acid
Acetone
Benzene
Chlorobenzene
Dimethyl sulfoxide (DMSO)
Ethanol
Ethyl acetate
Ethylbenzene
Ethylene glycol
Methanol
m-Xylene
o-Xylene
p-Xylene
Pyridine
Tetrahydrofuran
Toluene
1,1,1-Trichloroethane
1,1-Dichloroethylene
1,1-Dimethoxymethane
1,2-Dichloroethane
1,2-Dimethoxyethane
1,4-Dioxane
1-Pentanol(Amyl alcohol)
2,2,4-Trimethylpentane
2,2-Dimethoxypropane
2-Butanol
2-Ethoxyethanol(Cellosolve)
2-Hexanone(MBK)
2-Methoxyethanol(Methyl cellosolve)
2-Methyl-1-propanol(Isobutyl alcohol)
2-Methyltetrahydrofuran
3-Methyl-1-butanol(Isoamyl alcohol)
4-Methyl-2-pentanone(MIBK)
Acetonitrile
Anisole
Carbon tetrachloride
Chloroform
cis-1,2-Dichloroethylene
Cumene
Cyclohexane
Dichloromethane
Diethyl ether
Diisopropyl ether (DIPE)
Ethyl formate
Formamide
Isobutyl acetate
Isopropyl acetate
Methyl acetate
Methyl isopropyl ketone
Methylcyclohexane
N,N-Dimethylacetamide
N,N-Dimethylformamide
n-Butyl acetate
n-Heptane
n-Hexane
Nitromethane
N-methyl-2-pyrrolidone
n-Pentane
n-Propyl acetate
Propionaldehyde diethyl acetal
Sulfolane
tert-Butyl methyl ether
Tetralin
trans-1,2-Dichloroethylene
Trichloroethylene

Keywords

residual solvents
Pharmacopeia of Japan
Japanese Pharmacopoeia
medicine
VOC
working environment
Japanese Pharmacopeia
Pharmacopoeia of Japan
InertCap Pure-WAX

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